We adopt the following technical support:
Ultra-low dielectric loss: dielectric constant <5, reduce signal interference, bit error rate reduced by 90%.
Multi-layer precision wiring: support 0.1MM line width / line spacing, suitable for millimeter-wave radar and other high-frequency components.
Anti-electromagnetic interference (EMI): embedded shielding layer design, passed the FCC PART 15 standard test.
Eliminate anxiety: provide sample measurement and feedback measured data.
The DE-CW-1310 DFB EPI wafer, a high-performance epitaxial structure designed for distributed feedback (DFB) lasers operating at 1310 nm....
Ceramic thin-filmvacuum sensor Optical gas massflowmeter Liquid mass flowmeter Force sensor MEMS...
Photoelectric sensing chip Light source chips Optical transmission and modulationchips Optical detection and receptionchips...
Using a“Detach Core”which has two-layers carrier foil structure on the surface as a core, and forming...
Tenting process is a kind of subtractive process, the process as follows: Laminating photosensitive film...
Modified Semi-Added Process abbreviated as mSAP, which can be used on the core or build-up layers, pattern...
Semi-Added Process abbreviated as SAP, using on the build-up-layer pattern forming as follow：First depositing...
The product generally adopts the pressing lamination process of semi-curing sheets , and line formation...
The products generally adopt the Build-up Film Lamination process, and the circuit formation uses the...
Equipment features: 1. Non-destructive precision testing Micrometer-level probe contact technology...
