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    How to coordinate the third-generation semiconductor materials, ceramic carrier plate / shell and equipment to improve the production line efficiency?

    We provide an integrated solution of “materials + devices + equipment”:

    Semiconductor equipment: high-precision wafer bonding machine (± 5 Μ M alignment accuracy), ceramic sintering furnace (1600℃ uniform temperature control)

    Materials and devices: silicon defect density (<100CM ²) and customized loading plates

    Value point: Customers can improve the efficiency of the whole process from material processing to device packaging by 40%, and the yield is stable at more than 98.5%.

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